Mitsubishi Chemical will commercialize ultra‑high‑purity colloidal silica intended as a raw material for surface polishing agents for silicon wafers and for chemical mechanical polishing (CMP) slurries used on interconnect layers. ...
Mitsubishi Chemical will commercialize ultra‑high‑purity colloidal silica intended as a raw material for surface polishing agents for silicon wafers and for chemical mechanical polishing (CMP) slurries used on interconnect layers. ...
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Published on August 24, 2026 4:26 PM (GMT+8)SHARE THIS STORY
